| name | cleanroom-metrology-controller |
| description | Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry |
| allowed-tools | ["Read","Write","Glob","Grep","Bash"] |
| metadata | {"specialization":"nanotechnology","domain":"science","category":"fabrication","priority":"high","phase":6,"tools-libraries":["CDSEM recipe managers","Ellipsometry fitting software"]} |
| graph | {"domains":["domain:nanotechnology"],"skillAreas":["skill-area:mathematical-reasoning","skill-area:physics-simulation","skill-area:data-analysis"],"workflows":["workflow:experiment-design"],"roles":["role:research-engineer"]} |
Cleanroom Metrology Controller
Purpose
The Cleanroom Metrology Controller skill provides comprehensive in-line metrology for nanofabrication process control, enabling precise measurement and monitoring of critical dimensions, film thicknesses, and pattern quality.
Capabilities
- CD-SEM measurement recipes
- Spectroscopic ellipsometry analysis
- Film thickness mapping
- Surface profilometry
- Defect inspection
- Overlay measurement
Usage Guidelines
Metrology Control
-
CD-SEM Measurements
- Develop automated recipes
- Calibrate against reference
- Track process variation
-
Ellipsometry
- Select appropriate model
- Map thickness uniformity
- Characterize optical constants
-
Defect Inspection
- Set detection thresholds
- Classify defect types
- Track yield trends
Process Integration
- All fabrication processes
- Analysis Pipeline Validation
Input Schema
{
"measurement_type": "cd_sem|ellipsometry|profilometry|defect",
"target_parameter": "string",
"wafer_map": {"sites": "number", "pattern": "string"},
"specification": {
"target": "number",
"tolerance": "number"
}
}
Output Schema
{
"measurements": [{
"site": "string",
"value": "number",
"unit": "string"
}],
"statistics": {
"mean": "number",
"std_dev": "number",
"range": "number"
},
"uniformity": "number (%)",
"pass_fail": "boolean",
"trending_data": {"dates": [], "values": []}
}