dsa-process-controller

name	dsa-process-controller
description	Directed Self-Assembly skill for block copolymer lithography and nanoparticle templating
allowed-tools	["Read","Write","Glob","Grep","Bash"]
metadata	{"specialization":"nanotechnology","domain":"science","category":"fabrication","priority":"medium","phase":6,"tools-libraries":["BCP simulation tools","SCFT (Self-Consistent Field Theory)"]}
graph	{"domains":["domain:nanotechnology"],"skillAreas":["skill-area:mathematical-reasoning","skill-area:physics-simulation","skill-area:data-analysis"],"workflows":["workflow:experiment-design"],"roles":["role:research-engineer"]}

DSA Process Controller

Purpose

The DSA Process Controller skill provides directed self-assembly process control for block copolymer lithography and nanoparticle templating, enabling sub-lithographic patterning through controlled polymer phase separation.

Capabilities

• Block copolymer selection and design
• Annealing protocol optimization
• Defect density analysis
• Pattern transfer protocols
• Graphoepitaxy and chemoepitaxy
• Long-range order characterization

Usage Guidelines

DSA Process Control

1. BCP Selection

   • Match pitch to target
   • Consider chi-N product
   • Select morphology (lamellar, cylindrical)

2. Annealing Optimization

   • Choose thermal vs solvent vapor
   • Optimize temperature/time
   • Achieve equilibrium morphology

3. Defect Analysis

   • Classify defect types
   • Quantify defect density
   • Identify root causes

Process Integration

• Directed Self-Assembly Process Development
• Nanolithography Process Development

Input Schema

{
  "bcp_system": "string (e.g., PS-b-PMMA)",
  "target_pitch": "number (nm)",
  "morphology": "lamellar|cylindrical|spherical",
  "guiding_type": "graphoepitaxy|chemoepitaxy",
  "substrate_pattern": "string"
}

Output Schema

{
  "annealing_protocol": {
    "method": "thermal|svA",
    "temperature": "number (C)",
    "time": "number (hours)",
    "solvent": "string (optional)"
  },
  "achieved_pitch": "number (nm)",
  "defect_density": "number (defects/um2)",
  "correlation_length": "number (nm)",
  "pattern_quality": "string"
}