菜单
Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction
默认使用会先检查来源的 Prompt；你也可以切换为直接命令，或下载本地副本。
决定是否安装前，请先阅读 SKILL.md，以及 SkillsMP 当前展示的配套文件。
用 Codex 或 Claude 帮你安装 复制这段 Prompt，粘贴到 Codex、Claude 或其他助手里，让它检查 Skill 页面并帮你完成安装。
直接命令不会经过审查 Prompt；运行前请先检查来源。
npx skills add https://github.com/a5c-ai/babysitter --skill ebl-process-controller命令会保持在同一行。复制前请横向滚动并检查完整内容。
想先保存到本地？可下载 SkillsMP 当前能够提供的文件。
Reference for querying the Atlas knowledge graph through its MCP tools — the SECONDARY enrichment/comparison layer that adds best-practice context to systems you have ALREADY scanned from your real sources (`az`, repos, dirs). Use when you need to look up nodes, edges, kinds, clusters, stats, or wiki pages in Atlas to compare against your real inventory. (atlas graph, query atlas, atlas mcp, search the graph, graph neighbors, atlas record, atlas kinds, enrichment layer)
Atlas turns your STATED NEED into a real systems atlas by SCANNING your actual sources (Azure via `az`, git repos, local dirs) and process/data mining them, THEN enriching against the Atlas knowledge graph. Use this skill when asked to inventory/map your real systems, scan your cloud + repos + directories, mine the real processes or data they contain, or collect their real constraints/gotchas. (atlas, scan my systems, inventory our azure account, map my repos, real systems atlas, process mining, data mining, collect nuances, system discovery)
This skill should be used when the user asks to "find skills in the wild", "assimilate popular workflows", "discover SKILL.md files in repos", "research external skills", "find workflow patterns", "survey the skill landscape", "what skills exist out there", or wants to investigate public repositories for extractable processes, babysitter plugins, and reusable procedural insights. Searches GitHub for SKILL.md files, classifies repos by archetype, and maintains structured research under docs/reference-repos/.
正在显示 SKILL.md
基于 SOC 职业分类
| name | ebl-process-controller |
| description | Electron Beam Lithography skill for high-resolution nanopatterning with dose optimization and proximity effect correction |
| allowed-tools | ["Read","Write","Glob","Grep","Bash"] |
| metadata | {"specialization":"nanotechnology","domain":"science","category":"fabrication","priority":"high","phase":6,"tools-libraries":["BEAMER","GenISys TRACER","Raith NanoSuite"]} |
| graph | {"domains":["domain:nanotechnology"],"skillAreas":["skill-area:mathematical-reasoning","skill-area:physics-simulation","skill-area:data-analysis"],"workflows":["workflow:experiment-design"],"roles":["role:research-engineer"]} |
The EBL Process Controller skill provides comprehensive electron beam lithography process control, enabling high-resolution nanopatterning through dose optimization, proximity effect correction, and critical dimension control.
Pattern Preparation
Dose Optimization
Process Integration
{
"pattern_file": "string",
"resist": "string",
"thickness": "number (nm)",
"target_cd": "number (nm)",
"beam_voltage": "number (kV)",
"beam_current": "number (pA)"
}
{
"optimized_dose": "number (uC/cm2)",
"pec_parameters": {
"alpha": "number",
"beta": "number",
"eta": "number"
},
"write_time": "number (hours)",
"expected_cd": "number (nm)",
"cd_uniformity": "number (3sigma)"
}